ANTONIO JESUS
GARCIA LOUREIRO
Catedrático de universidade
GUILLERMO
INDALECIO FERNANDEZ
Investigador no período 2017-2019
Publicacións nas que colabora con GUILLERMO INDALECIO FERNANDEZ (39)
2020
-
Benchmarking of FinFET, Nanosheet, and Nanowire FET Architectures for Future Technology Nodes
IEEE Access, Vol. 8, pp. 53196-53202
2019
-
A multi-method simulation toolbox to study performance and variability of nanowire FETs
Materials, Vol. 12, Núm. 15
-
AXC: A new format to perform the SpMV oriented to Intel Xeon Phi architecture in OpenCL
Concurrency Computation , Vol. 31, Núm. 1
-
Drift-Diffusion Versus Monte Carlo Simulated ON-Current Variability in Nanowire FETs
IEEE Access, Vol. 7, pp. 12790-12797
-
Impact of gate edge roughness variability on FinFET and gate-all-around nanowire FET
IEEE Electron Device Letters, Vol. 40, Núm. 4, pp. 510-513
-
Impact of threshold voltage extraction methods on semiconductor device variability
Solid-State Electronics, Vol. 159, pp. 165-170
2018
-
Analysis of Fluctuation Sensitivity Map Algorithms Applied to a 10nm GAA NW FET
Proceedings of the 2018 12th Spanish Conference on Electron Devices, CDE 2018
-
FinFET versus gate-all-around nanowire FET: Performance, scaling, and variability
IEEE Journal of the Electron Devices Society, Vol. 6, Núm. 1, pp. 332-340
-
FoMPy: A figure of merit extraction tool for semiconductor device simulations
2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2018
-
Impact of Cross-Sectional Shape on 10-nm Gate Length InGaAs FinFET Performance and Variability
IEEE Transactions on Electron Devices, Vol. 65, Núm. 2, pp. 456-462
-
Improving performance of iterative solvers with the AXC format using the Intel Xeon Phi
Journal of Supercomputing, Vol. 74, Núm. 6, pp. 2823-2840
-
MPI-Performance-Aware-Reallocation: method to optimize the mapping of processes applied to a cloud infrastructure
Computing, Vol. 100, Núm. 2, pp. 211-226
-
Spatial Sensitivity of Silicon GAA Nanowire FETs under Line Edge Roughness Variations
IEEE Journal of the Electron Devices Society, Vol. 6, pp. 601-610
2017
-
Fluctuation Sensitivity Map: A Novel Technique to Characterise and Predict Device Behaviour Under Metal Grain Work-Function Variability Effects
IEEE Transactions on Electron Devices, Vol. 64, Núm. 4, pp. 1695-1701
-
Metal Grain Granularity Study on a Gate-All-Around Nanowire FET
IEEE Transactions on Electron Devices, Vol. 64, Núm. 12, pp. 5263-5269
-
Scaling/LER study of Si GAA nanowire FET using 3D finite element Monte Carlo simulations
Solid-State Electronics, Vol. 128, pp. 17-24
2016
-
Comparison of Fin-Edge Roughness and Metal Grain Work Function Variability in InGaAs and Si FinFETs
IEEE Transactions on Electron Devices, Vol. 63, Núm. 3, pp. 1209-1216
-
GWMEP: Task-Manageras-a-Service in Apache CloudStack
IEEE Internet Computing, Vol. 20, Núm. 2, pp. 42-49
-
Scaling/LER study of Si GAA nanowire FET using 3D Finite Element Monte Carlo simulations
2016 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2016
-
Simulation study of scaled In0.53Ga0.47As and Si FinFETs for sub-16 nm technology nodes
Semiconductor Science and Technology, Vol. 31, Núm. 7