A machine learning approach to model the impact of line edge roughness on gate-all-around nanowire FETs while reducing the carbon footprint

  1. García-Loureiro, A.
  2. Seoane, N.
  3. Fernández, J.G.
  4. Comesaña, E.
  5. Pichel, J.C.
Journal:
PLoS ONE

ISSN: 1932-6203

Year of publication: 2023

Volume: 18

Issue: 7 JULY

Type: Article

DOI: 10.1371/JOURNAL.PONE.0288964 GOOGLE SCHOLAR lock_openOpen access editor
Data source: Scopus