Scaling of metal gate workfunction variability in nanometer SOI-FinFETs

  1. Indalecio, G.
  2. Seoane, N.
  3. Aldegunde, M.
  4. Kalna, K.
  5. García-Loureiro, A.J.
Proceedings:
ULIS 2014 - 2014 15th International Conference on Ultimate Integration on Silicon

Year of publication: 2014

Pages: 105-108

Type: Conference paper

DOI: 10.1109/ULIS.2014.6813927 GOOGLE SCHOLAR
Data source: Scopus